As protection gas for all processes in which the presence of traces of chemically active gases may interfere:
- In the technique of welding.
- For the technique of doping and engraving for the manufacture of semiconductors and circuits in the electronics industry.
- For lighting tubes and incandescent lamps.
- In metallurgical analysis by emission spectrometry (ES) and in analysis by plasma induced by coupling (ICP).
- Atomic absorption (AAS) with graphite chamber.
- As carrier gas in gas chromatography (GC).
- For special processes in the analytical scientific field of Research and Development.